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Extreme unseeable laser excitation of molecular nitrogen: perturbations and predissociation.
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この項目「極端紫外線リソグラフィ」は途中まで翻訳されたものです。（原文：en:extreme ultraviolet lithography 17:56, 29 may 2013 ） 翻訳作業に協力して下さる方を求めています。ノートページや履歴、翻訳のガイドラインも参照してください。 要約欄への翻訳情報の記入をお忘れなく.
Linear polarization and unconditioned flux density of silicon monoxide masers and active assemblage objects at millimetre wavelengths.
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Analysis and modeling of photomask near-fields in sub-wavelength deep ultraviolet lithography with optical law of proximity corrections.
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